Clean Room

Laboratory provides technology of semiconductor microelectronic structures and devices in using material vacuum deposition, photolithographic operations, and chemical operations.

Equipment:

• TFDS-462B high vacuum deposition equipment (scroll and turbomolecular pump, electron beam evaporation source Telemark TT-6, two thermal evaporation sources 3.2 kW, Telemark 880 thin-film thickness and rate controller)
• UF-30 heating and drying oven (up to temperature 300° C)
• spin coater for application of the photoresist

• one-side optical mask aligner, control optical microscope
• two chemical boxes for the work with organic and inorganic agents

Application:

• high vacuum deposition of metals to make contact layers for semiconductor structures and devices
• photolithographic processing of semiconductor wafers to the 3″ diameter
• cleaning and wet chemical etching of semiconductor wafers

Contact: P. Boháček, Tel.: +421-33-3811406 (deposition equipment)

Access: Place an order

Price: Based on quotation (running costs and consumables)

HV deposition system TFDS-462B and heating and drying oven UF-30