PLD Technology

The laboratory enables preparation of different, mainly oxide thin films, monolayer by monolayer film structure and combinatorial thin films in the same vacuum cycle. Lower substrate temperatures and smaller targets comparing to other deposition methods are used.


  • KrF excimer laser (248 nm) with repetition frequency 1-20 Hz and max. energy 370 mJ
  •  2 inch substrate holder with programmable substrate temperature of 950 °C (for Si substrate) and 850 °C (for transparent substrate)
  •  Programmable target-to-substrate distance from 55 to 105 mm, base pressure 5× 10-7 Torr
  • Smart window for clean optical beam path beam energy measurement
  • Number of targets: six, 2 inch diameter or smaller



  • Deposition of high-quality thin superconducting, manganite, ferroic, dielectric (oxide) films at low substrate temperatures
  • Deposition of multilayer structures with a fine control of the film thickness down to atomic monolayer.

Contact: Š. Chromik, Tel.: +421-2-5922 2339

Access: guided access after reservation via e-mail or phone

Price: 0 Eur/hour for SAS employees


MBE/PLD-2000 Pulsed Laser Deposition system

YBCO thin film prepared on a 2 inch diameter CeO2 buffered r-sapphire substrate