Ing. Ivan KUNDRATA

  • 2019

Kundrata, I., Fröhlich, K., Vančo, L., Mičušík, M., and Bachmann, J.: Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films, Beilstein J. Nanotechnol. 10 (2019) 1443-1451.

Chymo, F., Fröhlich, K., Kundrata, I., Hušeková, K., Harmatha, L., Racko, J., Breza, J., and Mikolášek, M.: Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting, AIP Conf. Proc. 2131 (2019) 020020.

  • 2018

Fröhlich, K., Kundrata, I., Blaho, M., Precner, M., Ťapajna, M., Klimo, M., Šuch, O.,  and Škvarek, O.: Performance of HfOx– and TaOx-based resistive switching structures in circuits for min and max functions implementation, MRS Adv. 3 (2018) Iss. 59, 3427-3432.

Fröhlich, K., Kundrata, I., Blaho, M., Precner, M., Ťapajna, M., Klimo, M., Šuch, O., and Škvarek, O.: Hafnium oxide and tantalum oxide based resistive switching structures for realization of minimum and maximum functions, J. Applied Phys. 124 (2018) 152109.

  • 2017

Kukli, K., Kemeli, M., Vehkamäki, M., Heikkilä, M., Mizohata, K., Kalam, K., Ritala, M., Leskelä, M.,Kundrata, I., Fröhlich, K., : Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films,. AIP Adv. 7 (2017) 025001. (APVV 14-0560). (VEGA 2/0138/14).

  • 2015

Kundrata, I., Fröhlich, K., Ballo, P., : Lithium ion intercalation into thin film anatase In: Proc. 21th Inter. Conf. on Applied Phys. of Cond. Matter (APCOM 2015). Eds. J. Vajda and I. Jamnický. Bratislava: FEI STU 2015. ISBN 978-80-227-4373-0. P. 184-188.